de Valicourt, G and Porzi, C and Guina, M and Balkan, N (2010) Dilute nitride vertical-cavity gate for all-optical logic at 1.3 µm. IET Optoelectronics, 4 (5). pp. 201-209. DOI https://doi.org/10.1049/iet-opt.2009.0078
de Valicourt, G and Porzi, C and Guina, M and Balkan, N (2010) Dilute nitride vertical-cavity gate for all-optical logic at 1.3 µm. IET Optoelectronics, 4 (5). pp. 201-209. DOI https://doi.org/10.1049/iet-opt.2009.0078
de Valicourt, G and Porzi, C and Guina, M and Balkan, N (2010) Dilute nitride vertical-cavity gate for all-optical logic at 1.3 µm. IET Optoelectronics, 4 (5). pp. 201-209. DOI https://doi.org/10.1049/iet-opt.2009.0078
Abstract
The authors report on the design and performance of an all-optical vertical-cavity semi-conductor gate (VCSG) based on dilute nitride (GaInNAs/GaAs) quantum wells, proposed for performing AND/OR or NAND/NOR logic functions. In particular, the authors analyse the effect of non-linear refractive index variation on the overall non-linear characteristic of the device. Compared to typical InP-based non-linear gates GaAs-based devices incorporating dilute nitride active regions are a step forward towards reducing the fabrication complexity and relaxing the design constrains by employing high-quality GaAs/AlAs distributed Bragg reflectors. The authors develop a predictive model of VCSG relying on numerical simulation. Trade-off between the operation bandwidth and the modulation depth is found out associated to a variation of the refractive index for different optical injection conditions.
Item Type: | Article |
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Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
Divisions: | Faculty of Science and Health > Computer Science and Electronic Engineering, School of |
SWORD Depositor: | Unnamed user with email elements@essex.ac.uk |
Depositing User: | Unnamed user with email elements@essex.ac.uk |
Date Deposited: | 05 Mar 2012 16:57 |
Last Modified: | 05 Dec 2024 11:22 |
URI: | http://repository.essex.ac.uk/id/eprint/2246 |